ATI Japan Corp.

CEO Msg

ATI Japan Corp.
Representative Director Masahiro Kawasaki

ATI Japan Corp.,
centered on world-class ultra-thick thermal oxide film manufacturing technology, provides solutions that support the future of the optical communication and semiconductor industries.

Our proprietary ultra-thick thermal oxide film manufacturing technology achieves unparalleled thickness and high quality, earning high praise from domestic and international customers.
Currently, the optical communication and semiconductor industries are becoming increasingly important as the core of next-generation industries such as data centers, AI, and electric vehicles.

Through the most advanced film deposition process, our company is committed to enhancing the performance and reliability of critical devices supporting these industries.
At the same time, we are expanding our view from Japan to the world, collaborating with international partners to deepen R&D and manufacturing technology.

We firmly believe in the maxims of "being sincere about technology," "seriously engaging with customers," and "pursuing ultimate quality," and we aim to be a company that continuously takes on challenges.
We kindly ask for your continued support and guidance to ATI Japan.

Biography of Representative Director Masahiro Kawasaki

Career of Masahiro Kawasaki, Representative Director

　　May 1998   　 Established KST World Co., Ltd. in Fukui City, Fukui Prefecture.
　　March 1999  　Established Kawasaki Semiconductor Technology America Corp. (KST America).
　　　　　　　　Opened offices in California and Arizona. Served as CEO.
　　January 2013　Established Kawasaki Semiconductor Technology Taiwan Corp. (KST Taiwan).
　　　　　　　　Opened office in Kaohsiung City. Served as Chairman.
　　　　　　　　Kawasaki Semiconductor Technology Taiwan Corp.
　　January 2022　Stepped down as Representative Director and President of Seiren KST Co., Ltd.
　　March 2022  　Established ATI Japan Corp.

Corporate Philosophy

■ Mission
To change the world of optical communication and semiconductors with the world's highest-level ultra-thick thermal oxide film manufacturing technology.
ATI Japan contributes to the advancement and reliability improvement of the optical communication and semiconductor industries through its ultra-thick thermal oxide film manufacturing technology. We strive to realize a sustainable affluent society through creativity and realization capability.

■ Vision
To become a globally recognized technical brand where "ATI Japan is synonymous with ultra-thick thermal oxide film."
Our goal is to continuously maintain world leadership in quality, performance, and technological innovation, and to be the company of choice for customers and the industry.

■ Values
The values we cherish:
Sincerity and Trust
　　Always maintain a sincere attitude toward both technology and people.
Challenge Technological Innovation
　　Not satisfied with the status quo, continuously challenge the limits of processes and equipment.
Quality First Principle
　　Pursue uncompromising quality in a world demanding nano-level precision.
Customer-Centric Manufacturing
　　Listen to customer voices and walk the path of solving challenges together.
Global Perspective
　　Deliver technology originating in Japan to the world and create international value.

Quality Policy / Environmental Commitment

■ Quality Policy

ATI Japan Corp. shall always provide quality that meets customer expectations through the world's top ultra-thick thermal oxide film manufacturing technology.
We commit to quality improvement company-wide based on the following fundamental policies for quality activities:
・Uncompromising quality principle pursuing nano-level precision
・Continuous improvement starting from customer feedback
・Thorough standardization and visualization of processes, equipment, and materials
・Operation and continuous improvement of the Quality Management System (QMS)
・Providing trust through simultaneous pursuit of quality and safety

■ Environmental Commitment

ATI Japan Corp. recognizes global environmental protection as a vital corporate responsibility and promotes the development and operation of clean and sustainable film deposition technology.
We will implement the following environmental actions:
・Development and introduction of energy-saving and resource-conserving film deposition technology
・Thorough waste reduction, sorting, and recycling
・Compliance with environmental laws/regulations and transparent disclosure of information
・Raising environmental awareness among all employees and practicing action
・Promotion of corporate activities aimed at realizing a sustainable society

Company Overview

ATI Japan Corp.

• Company Name　　　： ATI Japan Corp. (Japanese: ATI Japan 株式会社)
• Date of Establishment ： March 18, 2022
• Representative Director　　　： Masahiro Kawasaki
• Head Office Address　　： 3-16-14 Nishishinagawa, Shinagawa-ku, Tokyo
• Nihonbashi Office　： JACC Building 4F, 2-8-5 Nihonbashi Horidome-cho, Chuo-ku, Tokyo
• Capital　　　： 130.35 million JPY, Capital Reserve: 130.35 million JPY
• Main Banks　　　： Mizuho Bank Shibuya Chuo Branch, MUFG Bank Nihonbashi Branch
• Secondhand Dealer License　： Tokyo Metropolitan Public Safety Commission Permit No. 301042422058
• Invoice Number　　　： T4010001225392
• Associations etc.　　： Japan-China Economic Association Supporting Member,
　　　　　　　　 MEMS Park Consortium Member

• Business Partners　　：

Company History

History of ATI Japan Corp.

　　March 2022: Established in Chuo-ku, Tokyo
　　May 2023: Relocated to Shinagawa-ku, Tokyo
　　October 2024: Opened "Nihonbashi Office" in Nihonbashi Horidome-cho, Chuo-ku, Tokyo
　　March 2025: Established ATIJ Hong Kong Limited

Executives

Board Members

Representative Director (CEO): Masahiro Kawasaki
Director: Enyo O
Director: Tetsuya Naito
Director: Masamitsu Yoshizawa
Auditor: Yoshikazu Kamiya

Representative Director (CEO) Masahiro Kawasaki	Director Enyo O
Director Tetsuya Naito	Director Masamitsu Yoshizawa

Advisors

Masayoshi Esashi

Masayoshi Esashi: CTO, MEMS Core Co., Ltd.

Concurrent Senior Research Fellow, Tohoku University

2022 - Order of the Sacred Treasure, Gold and Silver Star

Ryutaro Maeda

Ryutaro Maeda: National Institute of Advanced Industrial Science and Technology (AIST)

Emeritus Researcher, Device Technology Research Institute

Distinguished Professor, School of Instrument Science and Engineering, Xi'an Jiaotong University

Takunori Taira

Takunori Taira: Group Director, RIKEN SPring-8 Center

Specially Appointed Professor, Institute for Molecular Science, National Institutes of Natural Sciences

OPTICA (OSA), SPIE, IEEE Fellow

Fumiyuki Ota

Fumiyuki Ota: Former General Manager, Toshiba Oita Plant, Former Vice President, Dominion Semiconductor,

Former President, Tokuyama Toshiba Ceramics, Former Director, KST World

Nobuhiko Sasaki

Nobuhiko Sasaki: Chairman, Japan-China Economic Association, 13th President, Japan External Trade Organization (JETRO)

Former Counselor, OECD Mission, Ministry of Foreign Affairs, Vice-Minister for International Affairs, METI,

Director General, JETRO Beijing Center, etc.

Access Map

Head Office

　　〒141-0033
　　　　3-16-14 Nishishinagawa, Shinagawa-ku, Tokyo

Nihonbashi Office

　　〒103-0012
　　　　JACC Building 4F, 2-8-5 Nihonbashi Horidome-cho, Chuo-ku, Tokyo (📍View Address on Google Maps)
　　Tel: 03-6661-2251　　Fax: 03-6661-2252

5-minute walk from Ningyocho Station (Tokyo Metro Hibiya Line / Toei Asakusa Line)
8-minute walk from Bakurocho Station (JR Sobu Line Rapid)

Silicon Wafers

・Sizes: 4 inch (100mm) to 12 inch (300mm)
・Crystal Growth Method: FZ (Float Zone) (＞5,000Ω・cm, ＞10,000Ω・cm)
　　　　　　　CZ (Czochralski)
　　　　　　　MCZ (Magnetic Czochralski)
・Manufacturers: Japanese, US, Taiwanese, Korean, Chinese, European
・Prime Wafer, Test Wafer, Monitor Wafer, Dummy Wafer, Reclaimed Wafer

※For quotes, inquiries, etc., please contact us here

Example Wafer Specifications Handled

Silicon Wafer

Crystal Growth Method	Conductivity Type	Dopant	Crystal Orientation	Resistivity	Oxygen Content	Carbon Content	Diameter	Primary Flat Location	Primary Flat Length	Thickness	Front Surface	Back Surface
FZ	P	Boron	<100> ± 1 degree	10,000–99,999 Ω-cm	0.4 ppma	0.4 ppma	150 ± 0.5mm	<110> ± 2 degrees	57.5 ± 2.5mm	675 ± 10 um	Polished	Etched
CZ	P	Boron	<100> ± 1 degree	1~20	1~50	1~50	200 ± 0.2mm	<011> ± 1 degree	57.5 ± 2.5mm	725 ± 15 um	Polished	Etched
MCZ	P	Boron	<100> ± 1 degree	0.5~100.00	-	-	300 ± 0.2mm	Notch	Notch	760 ~ 790 um	Polished	Polished

Wafer Basic Knowledge

Grade	Primary Use	Quality Level	Characteristics	Cost Perception
Prime Grade	Actual Device Manufacturing (IC, Power Devices, MEMS, etc.)	Highest	・Surface roughness, defect density, particles are strictly controlled ・Most stable electrical properties and crystal defects	High
Monitor Grade	Process Monitoring in Mass Production Lines	High (Close to Prime)	・Supplied with the same crystal orientation, conductivity type, and resistivity as product wafers ・Defect tolerance is looser than Prime・Performance and quality are equivalent to Prime during the process	Medium (Cheaper than Prime)
Test Grade	Equipment Startup, Trial Processing, Research Applications	Medium	・Allows surface defects and micro-scratches・Electrical properties are not emphasized ・Reproducibility of product performance is not as strictly required as Monitor	Relatively Cheap
Dummy Grade	Handling Practice, Equipment Calibration, Physical Practice	Low	・Allowed to contain more cracks and defects ・Conductivity type, resistivity, etc., are usually not specified ・Essentially treated as a "silicon disc"	Cheapest

Ultra-Thick Film to Thin Film Thermal Oxide Wafers

ATI Japan uses the thermal oxidation method to deposit ultra-thick films. This achieves film quality unattainable with the CVD method.
Currently, we can handle film deposition in the range of 2µm to 20µm, which is considered difficult with the thermal oxidation method.
Wafer diameters supported are 6 inch (150mm), 8 inch (200mm), and 12 inch (300mm).
Thick films are widely used in optical communication, MEMS, medical, power devices, and other fields.
Thin films can be used for testing, evaluation, development, and other purposes.

※For quotes, inquiries, etc., please contact us here

InP Wafers

　　InP (Indium Phosphide) Wafers・・・Official Japan Agent for Grenoble InPACT, France
　　Indium Phosphide manufacturer covering all dopants (Fe, Sn, Zn, S) and
　　all diameters (2", 3", 4")

　　Properties: High-efficiency semiconductor for high-frequency communication and optical communication.
　　Applications: Lasers, optical amplifiers, optical fibers for optical communication, etc.
　　Features: Possesses high electron mobility and high dielectric breakdown strength.

※For quotes, inquiries, etc., please contact us here

Thin Film SOI Wafers, Thick Film SOI Wafers, Bonded Wafers

・SOI (Silicon-on-Insulator) 　　ATI Japan offers SOI wafers of various specifications.
　　For small volumes and short lead times, you can choose from our stock SOI wafers.
　　Stock SOI wafers are available starting from one piece.

・Excellent Device Layer Uniformity (±0.1µm)
・Low Stress Close to Single Crystal Wafer
・Extremely Small Steps (0.5㎜)
・Extremely Thin Substrate Wafer (50µm～)
・POI Wafers, and other bonded wafers

・POI (Polymer-on-Insulator)
・SiC on Si
・GaN on Si
・Others
Please feel free to contact us regarding bonded wafers.

※For quotes, inquiries, etc., please contact us here

Semiconductor Related Parts

・O-ring 　　Official Japan agent for KT Seal, Taiwan, providing perfluoroelastomer O-rings with excellent chemical and plasma resistance.
　　Stable supply of O-rings officially adopted by TSMC and UMC.

※For quotes, inquiries, etc., please contact us here

Semiconductor Related Parts

・Piping AF (Anti-Fouling) Coating 　　Properties (Corrosion resistance, abrasion resistance)
　　Complex piping can be processed using Wet Coating

※For quotes, inquiries, etc., please contact us here

GPU Server

We handle products from the world's top server manufacturers.

※For quotes, inquiries, etc., please contact us here

Optical Components

Official agent for SiPhx optical modules.
1.6T, 800G, 400G Optical Transceivers

※To PDF

※For quotes, inquiries, etc., please contact us here

MEMS Consulting

We provide consulting services for foundries, personnel, patents, etc.

※For quotes, inquiries, etc., please contact us here

What’s New

Exhibition Announcement

We will be exhibiting at MEF2026 (MEMS Engineer Forum), held from Tuesday, April 21 to Wednesday, April 22, 2026.
The venue is KFC Hall in Ryogoku, Tokyo.

We will be showcasing our latest technologies and solutions at the event.
If you are attending, please be sure to stop by our booth.

Work

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ATI Japan Co., Ltd.
Tetsuya Naito
Tel: 03-6661-2251
Fax: 03-6661-2252
Email: t.naito@atij.jp